The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2017

Filed:

Apr. 16, 2014
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Wilhelmus Patrick Elisabeth Maria Op 'T Root, Nederweert, NL;

Adrianus Leonardus Gertrudus Bommer, Roermond, NL;

Robert De Jong, Eindhoven, NL;

Frank Everts, Eindhoven, NL;

Herman Philip Godfried, Amsterdam, NL;

Roland Pieter Stolk, Sprang-Capelle, NL;

Paul Van Der Veen, Waalre, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03F 7/20 (2006.01); H01S 3/104 (2006.01); H01S 3/0975 (2006.01); H01S 3/225 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70558 (2013.01); G03F 7/70025 (2013.01); G03F 7/70516 (2013.01); H01S 3/104 (2013.01); H01S 3/0975 (2013.01); H01S 3/225 (2013.01);
Abstract

A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.


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