The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2014
Filed:
Oct. 24, 2011
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Igor Petrus Maria Bouchoms, Veldhoven, NL;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Markus Franciscus Antonius Eurlings, Tilburg, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Igor Petrus Maria Bouchoms, Veldhoven, NL;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Markus Franciscus Antonius Eurlings, Tilburg, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprising a source that generates a beam of radiation, a support structure supporting a patterning device, a substrate table for holding a substrate, and a projection system projecting the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a vibration measurement apparatus configured to measure relative vibration between the patterning device and the substrate during exposure of the target portion. A control apparatus adjusts power of the radiation beam to compensate for the effect of the measured relative vibration on the pattern projected onto the substrate.