The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2015
Filed:
May. 04, 2010
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Markus Franciscus Antonius Eurlings, Tilburg, NL;
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
Antonie Hendrik Verweij, Dussen, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Markus Franciscus Antonius Eurlings, Tilburg, NL;
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
Antonie Hendrik Verweij, Dussen, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system for providing a beam of extreme ultra-violet radiation, a masking device for controlling the illumination of a patterning device by the beam of radiation, a support for supporting the patterning device, the patterning device configured to impart a pattern to the beam of radiation, a substrate table for holding a substrate, and a projection system for projecting the patterned beam of radiation onto a target portion of the substrate. The masking device includes a masking blade including a masking edge configured to delimit a boundary of an illumination region on the patterning device. The masking blade is configured to reflect extreme ultra-violet radiation incident on the masking blade such that at least a portion of the reflected radiation is not captured by the projection system.