The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2019
Filed:
Jan. 21, 2016
Asml Netherlands B.v., Veldhoven, NL;
Arno Jan Bleeker, Westerhoven, NL;
Ramon Mark Hofstra, Beekbergen, NL;
Erik Petrus Buurman, Veldhoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Alexander Matthijs Struycken, Eindhoven, NL;
Harm-Jan Voorma, Kerkdriel, NL;
Sumant Sukdew Ramanujan Oemrawsingh, Hazerswoude Dorp, NL;
Markus Franciscus Antonius Eurlings, Tilburg, NL;
Peter Frans Maria Muys, Ghent, BE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.