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For the Inventor, By the Inventor

Veldhoven, Netherlands

Erik Petrus Buurman

USPTO Granted Patents = 15 

Average Co-Inventor Count = 3.6

ph-index = 4

Forward Citations = 46(Granted Patents)


Company Filing History:

goldMedal15 out of 4,883 
 
Asml Netherlands B.v.
 patents

Years Active: 2008-2019

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15 patents (USPTO):Explore Patents
1. 10222702 - Radiation source (2019-03-05),
2. 9316924 - Lithographic apparatus, excimer laser and device manufacturing method (2016-04-19),
3. 9110377 - Lithographic apparatus, EUV radiation generation apparatus and device manufacturing method (2015-08-18),
4. 8663881 - Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device (2014-03-04),
5. 8598551 - EUV radiation source comprising a droplet accelerator and lithographic apparatus (2013-12-03),
6. 8462826 - Laser device (2013-06-11),
7. 8431916 - Radiation source and lithographic apparatus (2013-04-30),
8. 8089613 - Lithographic apparatus, excimer laser and device manufacturing method (2012-01-03),
9. 7868999 - Lithographic apparatus, source, source controller and control method (2011-01-11),
10. 7817247 - Lithographic apparatus, excimer laser and device manufacturing method (2010-10-19),
11. 7655367 - Lithographic apparatus and device manufacturing method (2010-02-02),
12. 7595863 - Lithographic apparatus, excimer laser and device manufacturing method (2009-09-29),
13. 7525638 - Lithographic apparatus and device manufacturing method (2009-04-28),
14. 7491478 - Lithographic apparatus and device manufacturing method (2009-02-17),
15. 7453551 - Increasing pulse-to-pulse radiation beam uniformity (2008-11-18),

Certainly! Here is an article about inventor Erik Petrus Buurman:

Title: Innovator Spotlight: Erik Petrus Buurman Revolutionizing Lithographic Tools

Introduction:

Erik Petrus Buurman, a brilliant inventor based in Veldhoven, NL, is making substantial contributions to the field of lithographic tools. With an impressive portfolio of 15 patents, Buurman's innovative work is redefining the industry standards.

Latest Patents:

One of Buurman's latest patents involves a radiation source for a lithographic tool that comprises a laser module emitting laser beams of different wavelengths and an optical isolation apparatus to enhance precision. Another patent addresses the CD-pitch dependency in lithographic pattern printing processes by adjusting the spectral intensity distribution of radiation.

Career Highlights:

Buurman is currently affiliated with ASML Netherlands B.V., a leading company in the semiconductor industry. His tenure at ASML has been marked by pioneering advancements in lithography technology, showcasing his expertise and vision in the field.

Collaborations:

Working alongside accomplished colleagues like Johannes Wilhelmus Maria Cornelis Teeuwsen and Erik Roelof Loopstra, Buurman has fostered a collaborative environment that nurtures innovation and fosters groundbreaking research.

Conclusion:

In conclusion, Erik Petrus Buurman's inventive spirit and dedication to advancing lithographic tools have positioned him as a key player in the industry. His relentless pursuit of excellence continues to inspire peers and aspiring inventors alike, shaping the future of technology in remarkable ways.

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