The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
Aug. 04, 2011
Erik Roelof Loopstra, Eindhoven, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Erik Petrus Buurman, Veldhoven, NL;
Uwe Bruno Heini Stamm, Goettingen, DE;
Erik Roelof Loopstra, Eindhoven, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Erik Petrus Buurman, Veldhoven, NL;
Uwe Bruno Heini Stamm, Goettingen, DE;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An EUV radiation generation apparatus includes a laser configured to generate pulses of laser radiation, and an optical isolation apparatus that includes a rotatably mounted reflector and a radially positioned reflector. The rotatably mounted reflector and the laser are synchronized such that a reflective surface of the rotatably mounted reflector is in optical communication with the radially positioned reflector when the optical isolation apparatus receives a pulse of laser radiation to allow the pulse of laser radiation to pass to a plasma formation location and cause a radiation emitting plasma to be generated via vaporization of a droplet of fuel material. The rotatably mounted reflector and the laser are further synchronized such that the reflective surface of the rotatably mounted reflector is at least partially optically isolated from the radially positioned reflector when the optical isolation apparatus receives radiation reflected from the plasma formation location.