The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2012
Filed:
Jul. 19, 2010
Robertus Cornelis Martinus DE Kruif, Eindhoven, NL;
Richard Joseph Bruls, Eindhoven, NL;
Johannes Wilhelmus Maria Cornelis Teeuwsen, Helmond, NL;
Erik Petrus Buurman, Veldhoven, NL;
Robertus Cornelis Martinus De Kruif, Eindhoven, NL;
Richard Joseph Bruls, Eindhoven, NL;
Johannes Wilhelmus Maria Cornelis Teeuwsen, Helmond, NL;
Erik Petrus Buurman, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.