Helmond, Netherlands

Johannes Wilhelmus Maria Cornelis Teeuwsen


Average Co-Inventor Count = 4.3

ph-index = 3

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2009-2016

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5 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Johannes Wilhelmus Maria Cornelis Teeuwsen

Introduction:

Johannes Wilhelmus Maria Cornelis Teeuwsen, a brilliant inventor hailing from Helmond, Netherlands, has left a significant mark in the field of lithography with a total of 5 patents to his name.

Latest Patents:

One of Teeuwsen's latest patents is a groundbreaking innovation in the lithography realm. His invention tackles the CD-pitch dependency issue in the lithographic pattern printing process, focusing on the spectral intensity distribution of radiation. By introducing adjustments to the spectral distribution of radiant intensity, Teeuwsen's lithographic apparatus ensures a more precise and uniform pattern printing process.

Career Highlights:

Currently affiliated with ASML Netherlands B.V., Teeuwsen showcases his expertise in the development of cutting-edge technology within the lithographic industry. His career highlights include a deep dive into lithographic apparatus, excimer lasers, and device manufacturing methods, showcasing his versatility and proficiency in the field.

Collaborations:

Throughout his career, Teeuwsen has collaborated with esteemed professionals in the industry, including Erik Petrus Buurman and Robertus Cornelis Martinus De Kruif. Together, they have worked on pushing the boundaries of lithography technology, further solidifying Teeuwsen's reputation as an innovative force to be reckoned with.

Conclusion:

Johannes Wilhelmus Maria Cornelis Teeuwsen's relentless pursuit of innovation and his exceptional contributions to the field of lithography have undoubtedly cemented his legacy as a pioneer in the industry. His inventive spirit and dedication continue to inspire future generations of inventors and researchers in the realm of technology and beyond.

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