The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7655367 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 02, 2010

Filed:

Mar. 21, 2006
Applicants:

Erik Petrus Buurman, Veldhoven, NL;

Thomas Josephus Maria Castenmiller, Eindhoven, NL;

Johannes Wilhelmus Maria Cornelis Teeuwsen, Helmond, NL;

Bearrach Moest, Eindhoven, NL;

Marc Antonius Maria Haast, Eindhoven, NL;

Inventors:
Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.


Find Patent Forward Citations

Buurman, Erik. (2010). Lithographic apparatus and device manufacturing method (U.S. Patent No. 7655367). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7655367

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