The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2013

Filed:

Nov. 29, 2010
Applicants:

Wilbert Jan Mestrom, Roermond, NL;

Erik Roelof Loopstra, Eindhoven, NL;

Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;

Erik Petrus Buurman, Veldhoven, NL;

Inventors:

Wilbert Jan Mestrom, Roermond, NL;

Erik Roelof Loopstra, Eindhoven, NL;

Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;

Erik Petrus Buurman, Veldhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); G03F 7/20 (2006.01); H05H 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An EUV radiation source includes a fuel supply configured to supply fuel to a plasma formation location. The fuel supply includes a nozzle configured to eject droplets of fuel, and a droplet accelerator configured to accelerate the fuel droplets. The EUV radiation source includes a laser radiation source configured to irradiate the fuel supplied by the fuel supply at the plasma formation location.


Find Patent Forward Citations

Quick Actions:

Mestrom, Wilbert. (2013). Euv radiation source comprising a droplet accelerator and lithographic apparatus (U.S. Patent No. 8598551). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8598551

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…