Armin Liebchen

Title: Armin Liebchen: Innovator in Lithography Systems

Introduction

Armin Liebchen is a notable inventor based in Hayward, California, recognized for his contributions to the field of lithography systems. With a total of five patents to his name, Liebchen has made significant advancements in optimizing lithographic processes.

Latest Patents

Liebchen's latest patents include a method for performing resist process calibration and optimization, as well as DOE optimization for providing OPE matching between different lithography systems. This innovative method involves several steps, including determining a calibrated resist model for a given process and target pattern using a first lithography system. It also includes selecting a second lithography system capable of being configured with various diffractive optical elements, simulating imaging performance, and optimizing the imaging performance through a genetic algorithm. Another significant patent focuses on a method, program product, and apparatus for simultaneous optimization of numerical aperture (NA) and sigma exposure settings based on the target layout. This method allows for the optimization of lithographic apparatus settings for any pattern concurrently with optical proximity correction (OPC).

Career Highlights

Liebchen is currently employed at ASML Masktools B.V., where he continues to develop innovative solutions in lithography technology. His work has been instrumental in enhancing the efficiency and effectiveness of lithographic processes.

Collaborations

Liebchen has collaborated with notable colleagues, including SangBong Park and Jang Fung Chen, contributing to the advancement of lithographic technologies through teamwork and shared expertise.

Conclusion

Armin Liebchen's contributions to the field of lithography systems through his patents and collaborative efforts highlight his role as an influential inventor. His work continues to shape the future of lithographic technology.