The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 2004

Filed:

Sep. 10, 2001
Applicant:
Inventor:

Armin Liebchen, Hayward, CA (US);

Assignee:

ASML Masktools B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/750 ; G06F 1/900 ; G03F 9/00 ;
U.S. Cl.
CPC ...
G06F 1/750 ; G06F 1/900 ; G03F 9/00 ;
Abstract

The present invention provides a method and apparatus for simulating an aerial image projected from an optical system, wherein the optical system includes a pupil and a mask. In general, the method comprises the steps of obtaining parameters for the optical system, calculating a kernel based on an orthogonal pupil projection of the parameters of the optical system onto a basis set, obtaining parameters of the mask, calculating a vector based on an orthogonal mask projection of the parameters of the mask onto a basis set, calculating a field intensity distribution using the kernel and the vector, and obtaining aerial image data from the field intensity distribution.


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