Johannes Cm Jasper

Title: Innovations of Johannes Cm Jasper

Introduction

Johannes Cm Jasper is a notable inventor based in Veldhoven, Netherlands. He has made significant contributions to the field of photolithography, with a total of two patents to his name. His work focuses on enhancing the efficiency and effectiveness of photolithographic apparatuses.

Latest Patents

One of his latest patents is a photolithographic apparatus that includes an illumination unit. This illumination unit comprises a radiation source unit, a first optical system, and an optical waveguide. The apparatus is designed to operate in both stepper and scanner modes, featuring a slit-shaped static illumination field with a variable width while maintaining energy within that field. Another significant patent is a scanning-slit exposure device that utilizes a radiation source emitting pulses through an exit window. This device includes an imaging system that projects the exit window image onto a surface to be exposed, with a scattering element to minimize exposure non-uniformities.

Career Highlights

Johannes Cm Jasper has been instrumental in advancing photolithographic technology through his innovative designs and patents. His work at ASML Lithography B.V. has positioned him as a key player in the industry, contributing to the development of cutting-edge lithography systems.

Collaborations

He has collaborated with notable colleagues such as Johannes C Mulkens and Marinus Aart Van Den Brink, further enhancing the innovative capabilities of his team.

Conclusion

Johannes Cm Jasper's contributions to photolithography through his patents and collaborative efforts have significantly impacted the field. His work continues to influence advancements in lithographic technology.