The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2001
Filed:
Mar. 06, 1998
Applicant:
Inventor:
Frank Bornebroek, Eindhoven, NL;
Assignee:
ASM Lithography B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/754 ; G01B 1/100 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/754 ; G01B 1/100 ;
Abstract
A lithographic projection apparatus with an off-axis alignment unit for aligning a substrate alignment mark (P,) with respect to a reference (RGP) is described. This unit comprises a structure (WEP) of deflection elements (,) which give the sub-beams having different diffraction orders coming from the diffractive substrate mark (P,) different directions so that these sub-beams are incident on separate reference gratings (,) and can be detected by separate detectors (DET). This unit also provides the possibility of aligning asymmetrical alignment marks with great accuracy.