Eindhoven, Netherlands

Alexander Straaijer

USPTO Granted Patents = 83 

 

Average Co-Inventor Count = 4.4

ph-index = 23

Forward Citations = 2,968(Granted Patents)

Forward Citations (Not Self Cited) = 2,556(Oct 12, 2025)


Inventors with similar research interests:


Location History:

  • Veldhoven, NL (2018 - 2020)
  • Eindhoven, NL (1997 - 2021)

Company Filing History:


Years Active: 1997-2021

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83 patents (USPTO):

Title: **Alexander Straaijer: A Pioneer in Lithography Innovations**

Introduction

Alexander Straaijer, an esteemed inventor located in Eindhoven, NL, has made significant contributions to the field of lithography, evidenced by his impressive portfolio of 83 patents. His work primarily focuses on enhancing the capabilities of lithographic projection apparatuses and their manufacturing methods, showcasing his innovative approach to complex engineering challenges.

Latest Patents

Among his latest advancements in the realm of lithography are two prominent patents related to lithographic projection apparatuses and device manufacturing methods. The first patent outlines a system where the space between the projection system and the substrate is filled with a liquid. This design features an edge seal member that surrounds the substrate, thus preventing liquid loss during the imaging or illumination of edge portions. The apparatus is equipped with a support structure for holding a patterning device, a substrate table, a projection system, a liquid supply mechanism, and a shutter that isolates the space to enhance operational efficiency.

In his second patent, he further develops the lithographic projection apparatus concept by introducing a support surface that accommodates an intermediary plate between the projection system and the substrate. This innovation allows for the projection of a beam through a liquid in the space separating the projecting apparatus from the substrate or other objects, thereby refining the performance and accuracy of lithography processes.

Career Highlights

Alexander has had a remarkable career working with leading companies in the industry, notably ASML Netherlands B.V. and ASML Lithography B.V. His tenure at these organizations has solidified his reputation as a key figure in the development of advanced lithographic technologies. He has played a crucial role in pushing the boundaries of what lithography can achieve and has significantly impacted semiconductor manufacturing processes globally.

Collaborations

Throughout his career, Alexander has collaborated with talented professionals in his field, including colleagues such as Joeri Lof and Bob Streefkerk. These partnerships have fostered an environment of innovation and excellence, contributing to the success of their projects and the advancement of lithographic technologies.

Conclusion

In summary, Alexander Straaijer stands out as a notable inventor in the lithography sector, with a substantial number of patents that highlight his innovative spirit. His contributions through various patents, combined with his collaborative efforts in renowned companies, have made a lasting impact on the industry. The ongoing developments resulting from his work continue to shape the future of lithographic projection and manufacturing methods.

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