The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2020
Filed:
Nov. 19, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Bob Streefkerk, Tilburg, NL;
Antonius Theodorus Anna Maria Derksen, Eindhoven, NL;
Joeri Lof, Eindhoven, NL;
Klaus Simon, Eindhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70875 (2013.01); G03F 7/70258 (2013.01); G03F 7/70341 (2013.01); G03F 7/70716 (2013.01); G03F 7/70891 (2013.01);
Abstract
An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.