The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2021
Filed:
Dec. 09, 2019
Asml Netherlands B.v., Veldhoven, NL;
Joeri Lof, Eindhoven, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Hans Butler, Best, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Erik Roelof Loopstra, Heeze, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Johannes Catharinus Hubertus Mulkens, Maastricht, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Frank Van Schaik, Eindhoven, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, SA;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor De Smit, Eindhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Helmar Van Santen, Amsterdam, NL;
Antonius Theodorus Anna Maria Derksen, Eindhoven, NL;
Hans Jansen, Eindhoven, NL;
Jacobus Johannus Leonardus Hendricus Verspay, Thorn, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.