The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2019
Filed:
Jun. 18, 2015
Asml Netherlands B.v., Veldhoven, NL;
Joeri Lof, Eindhoven, NL;
Antonius Theodorus Anna Maria Derksen, Eindhoven, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Aleksey Kolesnychenko, Nijmegen, NL;
Erik Roelof Loopstra, Heeze, NL;
Theodorus Marinus Modderman, Nuenen, NL;
Johannes Catharinus Hubertus Mulkens, Maastricht, NL;
Roelof Aeilko Siebrand Ritsema, Eindhoven, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor De Smit, Eindhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Helmar Van Santen, Amsterdam, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.