The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2019
Filed:
Dec. 20, 2016
Asml Netherlands B.v., Veldhoven, NL;
Joeri Lof, Eindhoven, NL;
Hans Butler, Best, NL;
Sjoerd Nicolaas Lambertus Donders, 's-Hertogenbosch, NL;
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Erik Roelof Loopstra, Heeze, NL;
Hendricus Johannes Maria Meijer, Veldhoven, NL;
Johannes Catherinus Hubertus Mulkens, Waalre, NL;
Roelof Aeilko Siebranc Ritsema, Eindhoven, NL;
Frank Van Schaik, Eindhoven, NL;
Timotheus Franciscus Sengers, 's-Hertogenbosch, NL;
Klaus Simon, Eindhoven, NL;
Joannes Theodoor De Smit, Eindhoven, NL;
Alexander Straaijer, Eindhoven, NL;
Bob Streefkerk, Tilburg, NL;
Erik Theodorus Maria Bijlaart, Rosmalen, NL;
Christian Alexander Hoogendam, Veldhoven, NL;
Helmar Van Santen, Amsterdam, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Mark Kroon, Utrecht, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.