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Veldhoven, Netherlands

Asml Lithography B.v.

USPTO Granted Patents = 2

Forward Citations = 11

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8 inventors (with patents filed for the assignee):

Erik Roelof Loopstra (1 out of 335 patents)

Wolfgang Singer (1 out of 120 patents)

Alexander Straaijer (1 out of 83 patents)

4. Johannes Wangler (1 out of 83 patents)

5. Martin Antoni (1 out of 31 patents)

6. Vadim Yevgenyevich Banine (1 out of 192 patents)

7. Wilhelm Egle (1 out of 13 patents)

8. Ronald A De Jager (1 out of 1 patent)

2 patents: Sort by Forward Citations

1. 6927403 - Illumination system that suppresses debris from a light source (2005-08-09),

2. 5986742 - Lithographic scanning exposure projection apparatus (1999-11-16),

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USPTO Data Jan 1 1976 - Dec 9 2025

2 Patents

#15 in Veldhoven

#2,159 in Netherlands

Veldhoven, Netherlands

Asml Lithography B.v.

Forward Citations = 11

8 inventors:

Erik Roelof Loopstra (1 out of 335 patents)

Wolfgang Singer (1 out of 120 patents)

Alexander Straaijer (1 out of 83 patents)

4. Johannes Wangler (1 out of 83 patents)

5. Martin Antoni (1 out of 31 patents)

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