The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 1999
Filed:
Mar. 27, 1997
Alexander Straaijer, Eindhoven, NL;
Ronald A De Jager, Naarden, NL;
ASML Lithography B.V., Veldhoven, NL;
Abstract
A lithographic scanning exposure projection apparatus is provided with a radiation source (1) providing radiation pulses, a lens system (3, 7), a mask (5), imaged onto a substrate (9) and scanning apparatus (10) for scanning an image of an exit window (2) of the radiation source at a scanning speed over the substrate (9). A controller (13) controls both the energy of the radiation pulses and the scanning speed in dependence on the required exposure dose on the substrate and the repetition rate of the radiation pulses. The controller ensures maximum throughput of substrates through the apparatus and a minimum dose non-uniformity on the substrates.