Company Filing History:
Years Active: 1999
Title: The Innovations of Ronald A De Jager
Introduction
Ronald A De Jager is a notable inventor based in Naarden, Netherlands. He has made significant contributions to the field of lithography, particularly in the development of advanced projection apparatuses. His work has implications for various industries, including semiconductor manufacturing.
Latest Patents
Ronald A De Jager holds a patent for a lithographic scanning exposure projection apparatus. This innovative apparatus is equipped with a radiation source that provides radiation pulses, a lens system, and a mask that is imaged onto a substrate. The scanning apparatus is designed to scan an image of the exit window of the radiation source at a specific scanning speed over the substrate. A controller manages both the energy of the radiation pulses and the scanning speed, ensuring optimal exposure dose on the substrate while maximizing throughput and minimizing dose non-uniformity.
Career Highlights
De Jager has had a distinguished career at ASML Lithography B.V., a leading company in the lithography equipment sector. His expertise in the field has allowed him to contribute to the advancement of technologies that are critical for the production of integrated circuits. His work has been instrumental in enhancing the efficiency and effectiveness of lithographic processes.
Collaborations
One of his notable collaborators is Alexander Straaijer. Together, they have worked on various projects that have pushed the boundaries of lithographic technology.
Conclusion
Ronald A De Jager's contributions to lithographic technology through his innovative patent and career at ASML Lithography B.V. highlight his importance in the field. His work continues to influence advancements in semiconductor manufacturing and related industries.