Asml Netherlands B.v.

Asm Lithography B.v.

Asm Lithography

Asml Lithography B.v.

Alexander Straaijer

Joeri Lof

Bob Streefkerk

Erik Roelof Loopstra

Johannes Catharinus Hubertus Mulkens

Klaus Simon

Christiaan Alexander Hoogendam

Sjoerd Nicolaas Lambertus Donders

Antonius Theodorus Anna Maria Derksen

Jeroen Johannes Sophia Maria Mertens

Joannes Theodoor De Smit

Helmar Van Santen

Roelof Aeilko Siebrand Ritsema

Aleksey Yurievich Kolesnychenko

Timotheus Franciscus Sengers

Hendricus Johannes Maria Meijer

Hans Butler

Frank Van Schaik

Erik Theodorus Maria Bijlaart

Arie Jeffrey Den Boef

Hans Jansen

Jacobus Johannus Leonardus Hendricus Verspay

Theodorus Marinus Modderman

Johannes Jacobus Matheus Baselmans

Joost Jeroen Ottens

Marcus Adrianus Van De Kerkhof

Henrikus Herman Marie Cox

Jan-Gerard Cornelis Van Der Toorn

Frits Van Der Meulen

Mark Kroon

Bernardus Antonius Slaghekke

Martijn Houkes

Gerardus Petrus Matthijs Van Nunen

Maurits Van Der Schaar

Scott Anderson Middlebrooks

Hendrik Jan Hidde Smilde

Markus Gerardus Martinus Maria Van Kraaij

Niels Geypen

Donis George Flagello

Kevin D Cummings

Patrick Warnaar

Ronald Franciscus Herman Hugers

Yue-Lin Peng

Si-Han Zeng

Jen-Yu Fang

Ching-Yi Hung

Gerardus Petrus Mattijs Van Nunen

Levinus Pieter Bakker

Marcel Mathijs Theodore Marie Dierichs

Jozef Maria Finders

Leon Martin Levasier

Marinus Aart Van Den Brink

Erik Petrus Buurman

Aleksey Yurievich Kolensnychenko

Jacobus Burghoom

Johannes Cm Jasper

Roelof Aeilko Siebranc Ritsema

J W De Klerk

Rogier H M Groeneveld

Jan W Martens

Ronald A De Jager

Sjoerd Nicolaas Lamburtus Donders

Antonius Derksen

Roelof Ritsema

Johannes Mulkens

Roelof Aeiko Siebrand Ritsema

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Lithographic apparatus and device manufacturing method

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

Disclosed is a method of measuring a parameter of a lithographic process, and associated inspection apparatus. The method comprises measuring at least two target structures on a substrate using a plurality of different illumination conditions, the target structures having deliberate overlay biases; to obtain for each target structure an asymmetry measurement representing an overall asymmetry that includes contributions due to (i) the deliberate overlay biases, (ii) an overlay error during forming of the target structure and (iii) any feature asymmetry. A regression analysis is performed on the asymmetry measurement data by fitting a linear regression model to a planar representation of asymmetry measurements for one target structure against asymmetry measurements for another target structure, the linear regression model not necessarily being fitted through an origin of the planar representation. The overlay error can then be determined from a gradient described by the linear regression model.

Metrology method and apparatus, lithographic system and device manufacturing method

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

The present invention provides a method for determining overlay. The method comprises obtaining an initial overlay estimate relating to a first set of targets and data about a second set of targets, wherein the data for a target comprises an intensity measurement of the target for each of a group of different wavelengths. The method further comprises using the initial overlay estimate to filter data relating to the second set of targets and using the filtered data to estimate overlay on the substrate.

Method for estimating overlay

In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process. The method comprising the steps of: obtaining first measurements comprising measurements of structural asymmetry relating to a plurality of first structures, each of said plurality of measurements of structural asymmetry corresponding to a different measurement combination of measurement radiation and a value for at least a first parameter; obtaining a plurality of second measurements of target asymmetry relating to a plurality of targets, each of said plurality of measurements of target asymmetry corresponding to one of said different measurement combinations, determining a relationship function describing the relationship between said first measurements and said second measurements, for each of said measurement combinations; determining, from said relationship function, a corrected overlay value, said corrected overlay value being corrected for structural contribution due to structural asymmetry in at least said first structure.

Metrology method and apparatus, computer program and lithographic system

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Eindhoven, Netherlands

Alexander Straaijer