The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2002
Filed:
Jun. 29, 1999
Applicant:
Inventor:
Arno Jan Bleeker, Eindhoven, NL;
Assignee:
ASM Lithography, B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/772 ; G03B 2/754 ;
U.S. Cl.
CPC ...
G03B 2/772 ; G03B 2/754 ;
Abstract
A lithographic apparatus exposes a radiation sensitive layer on a substrate to the pattern on a mask including pattern areas and opaque support. The apparatus uses a beam having a trapezoidal profile to provide a more uniform exposure at sub-field stitches in the event of any positional inaccuracies. The trapezoidal beam profile is generated by changing a characteristic, such as size or position, of the illumination beam on the mask during an exposure period.