The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2002
Filed:
Apr. 12, 1999
Sijbe A. H. Van Der Lei, Veldhoven, NL;
Rard Willem De Leeuw, Eindhoven, NL;
Gerrit Maarten Bonnema, Eindhoven, NL;
Wilhelmus Maria Corbeij, Eindhoven, NL;
ASM Lithography B.V., Veldhoven, NL;
Abstract
A lithographic apparatus of the scanning type in which reticle masking blades are opened at the beginning of a scan. Means are provided to compensate for an increase in the intensity density of the illumination beam as the reticle masking blades are opened. These means may comprise lamp control means for controlling a compensating decrease in the lamp intensity. The reticle masking blades may be manufactured of, e.g., quartz and provided with a reflective rear coating, e.g. of aluminum, so that portions of the illumination beam intercepted by the reticle masking blades are totally internally reflected.