The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2003
Filed:
Jun. 12, 2001
Christianus Gerardus Maria de Mol, Son en Breugel, NL;
Thomas Josephus Maria Castenmiller, Eindhoven, NL;
Marcel van Dijk, Eindhoven, NL;
Franciscus Antonius Chrysogonus Marie Commissaris, Veldhoven, NL;
Simon de Groot, Eindhoven, NL;
Catharina Johanna Lucia Maria van den Enden, Eindhoven, NL;
ASM Lithography B.V., Veldhoven, NL;
Abstract
The present invention provides a method of operating a lithographic projection apparatus including calculating a change in aberration effect in the projection system, due to heating effects, as a function of time, based on at least one set of predetermined parameters; and adjusting the lithographic projection apparatus to compensate for the calculated change in aberration effect. The parameters are obtained by a calibration operation, which may comprise a coarse calibration followed by at least one fine calibration. The coarse calibration yields a first estimate of at least a subset of the parameters. The estimate can be used as an input for a subsequent fine calibration. The calibration may also comprise a single fine calibration.