Asml Netherlands B.v.

Asml Holding N.v.

Carl-zeiss-smt Ag

Carl Zeiss Smt Gmbh

Asm Lithography B.v.

Koninklijke Philips Corporation N.v.

U.S. Philips Corporation

Asm Lithography

Amsl Netherlands B.v.

Asml Lithography B.v.

Cymer, Inc.

Erik Roelof Loopstra

Johannes Catharinus Hubertus Mulkens

Bob Streefkerk

Christiaan Alexander Hoogendam

Sjoerd Nicolaas Lambertus Donders

Jeroen Johannes Sophia Maria Mertens

Joeri Lof

Alexander Straaijer

Helmar Van Santen

Klaus Simon

Aleksey Yurievich Kolesnychenko

Vadim Yevgenyevich Banine

Timotheus Franciscus Sengers

Hans Butler

Johannes Jacobus Matheus Baselmans

Hans Jansen

Johannes Hubertus Josephina Moors

Joost Jeroen Ottens

Engelbertus Antonius Fransiscus Van Der Pasch

Marcel Mathijs Theodore Marie Dierichs

Patricius Aloysius Jacobus Tinnemans

Martinus Hendrikus Antonius Leenders

Johannes Henricus Wilhelmus Jacobs

Nicolaas Ten Kate

Marco Koert Stavenga

Marcus Adrianus Van De Kerkhof

Henrikus Herman Marie Cox

Michel Riepen

Arie Jeffrey Den Boef

Nicolaas Rudolf Kemper

Arno Jan Bleeker

Pieter Willem Herman De Jager

Levinus Pieter Bakker

Johannes Petrus Martinus Bernardus Vermeulen

Harry Sewell

Wim Tjibbo Tel

Johan Frederik Dijksman

Yvonne Wendela Kruijt-Stegeman

Frank Staals

Jan Haisma

William N Partlo

Wilhelm Ulrich

Wolfgang Singer

Hans-Juergen Mann

Maarten Marinus Johannes Wilhelmus Van Herpen

Sander Frederik Wuister

David R Shafer

Johannes Wangler

Markus Hauf

Jens Kugler

Uwe Stamm

Joannes Theodoor De Smit

Roelof Aeilko Siebrand Ritsema

Hendricus Johannes Maria Meijer

Antonius Theodorus Anna Maria Derksen

Gerardus Hubertus Petrus Maria Swinkels

Theodorus Marinus Modderman

Jacobus Johannus Leonardus Hendricus Verspay

Marc Wilhelmus Maria Van Der Wijst

Franciscus Johannes Joseph Janssen

Martinus Cornelis Maria Verhagen

Frits Van Der Meulen

Harmen Klaas Van Der Schoot

Jan Bernard Plechelmus Van Schoot

Richard Joseph Bruls

Andrei Mikhailovich Yakunin

Andrey Alexandrovich Nikipelov

Jan-Gerard Cornelis Van Der Toorn

Sergei Shulepov

Theodorus Petrus Maria Cadee

Tjarko Adriaan Rudolf Van Empel

Boris Menchtchikov

Bernhard Gellrich

Stephen Roux

Sven Antoin Johan Hol

Jan Van Eijk

Han-Kwang Nienhuys

Wilhelmus Josephus Box

Koen Jacobus Johannes Maria Zaal

Marcel Beckers

Hernes Jacobs

Bernhard Geuppert

Heine Melle Mulder

Paulus Martinus Maria Liebregts

Santiago E Del Puerto

Yim-Bun Patrick Kwan

Johannes Onvlee

Hans Van Der Laan

Christian Wagner

Andre Bernardus Jeunink

Sascha Bleidistel

Wouter Anthon Soer

Daniel Nicholas Galburt

Jozef Maria Finders

Martin Jacobus Johan Jak

Dirk Heinrich Ehm

Markus Franciscus Antonius Eurlings

Ramon Pascal Van Gorkom

Koen Steffens

Ronald Van Der Ham

A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Lithographic apparatus and device manufacturing method involving a heater

Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.

Projection system and mirror and radiation source for a lithographic apparatus

A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Mask assembly

Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Pellicle attachment apparatus

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.

Position measurement of optical elements in a lithographic apparatus

A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

Lithographic method

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.

Active drying station and method to remove immersion liquid using gas flow supply with gas outlet between two gas inlets

Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.

Dual stage lithographic apparatus and device manufacturing method

Growing community of inventors

Heeze, Netherlands

Erik Roelof Loopstra