The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2021
Filed:
Jun. 10, 2019
Asml Netherlands B.v., Veldhoven, NL;
Wouter Joep Engelen, Veldhoven, NL;
Otger Jan Luiten, Veldhoven, NL;
Andrey Alexandrovich Nikipelov, Eindhoven, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Pieter Willem Herman De Jager, Middelbeers, NL;
Erik Roelof Loopstra, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.