The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2020
Filed:
Apr. 06, 2017
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Bob Streefkerk, Tilburg, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); B05C 9/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70875 (2013.01); B05C 9/12 (2013.01); G03F 7/70341 (2013.01);
Abstract
A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.