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Location History:
- Almerk, NL (2016)
- Veldhoven, NL (2023)
- Almkerk, NL (2006 - 2024)
Years Active: 2006-2025
Title: Nicolaas Ten Kate: Pioneering Innovator in Lithographic Apparatus
Introduction:
Nicolaas Ten Kate is an esteemed inventor hailing from Almkerk, Netherlands. With an impressive portfolio of 126 patents, Ten Kate has made significant contributions to the field of lithographic apparatus. This article explores his latest patents, career highlights, collaborations, and his impact on the industry.
Latest Patents:
One of Ten Kate's latest inventions is a substrate holder and method of manufacturing a substrate holder. This innovative substrate holder is designed for use in a lithographic apparatus. It features a main body with CrN-coated first burls on one side to support the substrate and second burls on the other side.
Another notable patent by Ten Kate is a lithographic apparatus and cooling method. This invention focuses on a cooling apparatus integrated within the housing of a lithographic apparatus. By cooling at least a portion of the internal wall below the temperature of the optical components, this technology improves overall performance and longevity.
Career Highlights:
Nicolaas Ten Kate has contributed significantly to the field of lithographic apparatus during his career. He has worked at influential companies in the industry, including ASML Netherlands B.V. and ASML Holding N.V. These companies are renowned for their advancements in semiconductor manufacturing and lithography research.
Collaborations:
Throughout his career, Ten Kate has collaborated with brilliant minds in the industry. Two notable collaborators are Sjoerd Nicolaas Lambertus Donders and Nicolaas Rudolf Kemper. The combined expertise and innovation of these individuals have undoubtedly led to breakthroughs and advancements in lithographic apparatus technology.
Conclusion:
Nicolaas Ten Kate stands out as an exceptional inventor in the field of lithographic apparatus. His extensive patent portfolio showcases his expertise and dedication to advancing the industry. With contributions to substrate holder design and cooling methods, Ten Kate's inventions are instrumental in improving the performance and capabilities of lithographic apparatus. We can expect further contributions from him in the future, as he continues to drive innovation in this fascinating field.
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