Nicolaas Ten Kate

This inventor holds 141 USPTO granted patents and 20 published patent applications, plus 1 CIPO patent and 19 EPO patents, primarily in Lithographic Apparatus (CPC class G03F7-70341). Top assignees: Asml Netherlands B.v., Asml Holding N.v., Asme Netherlands B.v.. Active years: 2006-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nicolaas Ten Kate. Retrieved from https://idiyas.com/inventor/nicolaas-ten-kate

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 141 (Patent Applications = 20)

% Patents Active = 78.0

CIPO Patents = 1

EPO Patents = 19 (Patent Applications = 21)

Average Co-Inventor Count = 5.3

ph-index = 12

Forward Citations = 428(Granted Patents)

Forward Citations (Not Self Cited) = 259(Dec 10, 2025)

Inventors with similar research interests:

🔬 See more inventors

Location History:

Almerk, NL (2016)
Veldhoven, NL (2023)
Almkerk, NL (2006 - 2024)

Company Filing History:

139 out of 5,076

Asml Netherlands B.v.

Asme Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2006-2025

Loading Chart...

Areas of Expertise:

Lithographic Apparatus

Substrate Holder

Device Manufacturing Method

Fluid Handling System

Substrate Support

Cooling Method

Radioisotope Production

Charge Distribution

Patterned Layer Formation

Substrate Table

Fluid Handling Structure

Apparatus Operation

141 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12405539 - Substrate support and substrate table (2025-09-02),

2. 12366808 - Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder (2025-07-22),

3. 12353139 - Substrate holder and method of manufacturing a substrate holder (2025-07-08),

4. 12315756 - Method of manufacturing a substrate support for a lithographic apparatus, substrate table, lithographic apparatus, device manufacturing method, method of use (2025-05-27),

5. 12242206 - Method for preparing a substrate and lithographic apparatus (2025-03-04),

6. 12242204 - Substrate support, lithographic apparatus, method for manipulating charge distribution and method for preparing a substrate (2025-03-04),

7. 12204255 - Lithographic apparatus and method (2025-01-21),

8. 12072635 - Lithographic apparatus and a method of operating the apparatus (2024-08-27),

9. 12055862 - Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder (2024-08-06),

10. 12032296 - Fluid handling system, method and lithographic apparatus (2024-07-09),

11. 11960213 - Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder (2024-04-16),

12. 11860546 - Fluid handling structure for lithographic apparatus (2024-01-02),

13. 11807937 - Method and apparatus for forming a patterned layer of carbon, method of forming a patterned layer of material (2023-11-07),

14. 11754929 - Substrate holder and method of manufacturing a substrate holder (2023-09-12),

15. 11720034 - Lithographic apparatus and cooling method (2023-08-08),

Title: Nicolaas Ten Kate: Pioneering Innovator in Lithographic Apparatus

Introduction:

Nicolaas Ten Kate is an esteemed inventor hailing from Almkerk, Netherlands. With an impressive portfolio of 126 patents, Ten Kate has made significant contributions to the field of lithographic apparatus. This article explores his latest patents, career highlights, collaborations, and his impact on the industry.

Latest Patents:

One of Ten Kate's latest inventions is a substrate holder and method of manufacturing a substrate holder. This innovative substrate holder is designed for use in a lithographic apparatus. It features a main body with CrN-coated first burls on one side to support the substrate and second burls on the other side.

Another notable patent by Ten Kate is a lithographic apparatus and cooling method. This invention focuses on a cooling apparatus integrated within the housing of a lithographic apparatus. By cooling at least a portion of the internal wall below the temperature of the optical components, this technology improves overall performance and longevity.

Career Highlights:

Nicolaas Ten Kate has contributed significantly to the field of lithographic apparatus during his career. He has worked at influential companies in the industry, including ASML Netherlands B.V. and ASML Holding N.V. These companies are renowned for their advancements in semiconductor manufacturing and lithography research.

Collaborations:

Throughout his career, Ten Kate has collaborated with brilliant minds in the industry. Two notable collaborators are Sjoerd Nicolaas Lambertus Donders and Nicolaas Rudolf Kemper. The combined expertise and innovation of these individuals have undoubtedly led to breakthroughs and advancements in lithographic apparatus technology.

Conclusion:

Nicolaas Ten Kate stands out as an exceptional inventor in the field of lithographic apparatus. His extensive patent portfolio showcases his expertise and dedication to advancing the industry. With contributions to substrate holder design and cooling methods, Ten Kate's inventions are instrumental in improving the performance and capabilities of lithographic apparatus. We can expect further contributions from him in the future, as he continues to drive innovation in this fascinating field.

Profile summary based on public USPTO records.