The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2023
Filed:
Jan. 31, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Gosse Charles De Vries, Veldhoven, NL;
Nicolaas Ten Kate, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhove, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70891 (2013.01);
Abstract
A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, comprising at least one housing comprising at least one internal wall, at least one optical component arranged within at least one chamber defined at least in part by the at least one internal wall and configured to receive a radiation beam and a cooling apparatus arranged to cool at least a portion of the at least one internal wall to a temperature below that of the at least one optical component.