The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2023

Filed:

Feb. 26, 2019
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Sonia Castellanos Ortega, Leiden, NL;

Jan Verhoeven, Kockengen, NL;

Joost Wilhelmus Maria Frenken, Leiden, NL;

Pavlo Antonov, Valkenburg, NL;

Nicolaas Ten Kate, Almkerk, NL;

Olivier Christian Maurice Lugier, Amsterdam, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C23C 16/26 (2006.01); C23C 16/48 (2006.01); H01L 21/02 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
C23C 16/047 (2013.01); C23C 16/26 (2013.01); C23C 16/482 (2013.01); C23C 16/483 (2013.01); H01L 21/02527 (2013.01); H01L 21/02636 (2013.01); H01L 29/1606 (2013.01);
Abstract

Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.


Find Patent Forward Citations

Loading…