Asml Netherlands B.v.

Asml Holding N.v.

Carl Zeiss Smt Gmbh

Asml Holdings N.v.

Asme Netherlands B.v.

Nicolaas Ten Kate

Sjoerd Nicolaas Lambertus Donders

Raymond Wilhelmus Louis Lafarre

Nicolaas Rudolf Kemper

Johannes Henricus Wilhelmus Jacobs

Christiaan Alexander Hoogendam

Joost Jeroen Ottens

Michel Riepen

Nina Vladimirovna Dziomkina

Yogesh Pramod Karade

Martinus Cornelis Maria Verhagen

Jeroen Johannes Sophia Maria Mertens

Johannes Petrus Maria Smeulers

Frits Van Der Meulen

Marcel Beckers

Henrikus Herman Marie Cox

Jan-Gerard Cornelis Van Der Toorn

Elisabeth Corinne Rodenburg

Stefan Philip Christiaan Belfroid

Martinus Hendrikus Antonius Leenders

Sergei Shulepov

Herman Vogel

Erik Roelof Loopstra

Franciscus Johannes Herman Maria Teunissen

Roelof Frederik De Graaf

Marco Koert Stavenga

Franciscus Johannes Joseph Janssen

Niek Jacobus Johannes Roset

Ferdy Migchelbrink

Herman Boom

Jacobus Johannus Leonardus Hendricus Verspay

Theodorus Petrus Maria Cadee

Cornelius Maria Rops

Rogier Hendrikus Magdalena Cortie

Jim Vincent Overkamp

Patricius Aloysius Jacobus Tinnemans

Boris Menchtchikov

Johannes Anna Quaedackers

Antonius Johannus Van Der Net

Laurentius Johannes Adrianus Van Bokhoven

Frederik Eduard De Jong

Stoyan Nihtianov

Christianus Gerardus Maria De Mol

Richard Moerman

Thibault Simon Mathieu Laurent

Johan Gertrudis Cornelis Kunnen

Siegfried Alexander Tromp

Robbert Jan Voogd

Johannes Catharinus Hubertus Mulkens

Erik Henricus Egidius Catharina Eummelen

Koen Steffens

Antonius Franciscus Johannes De Groot

Adrianus Hendrik Koevoets

Hans Jansen

Ronald Van Der Ham

Martijn Houben

Jan Steven Christiaan Westerlaken

Theodorus Wilhelmus Polet

Giovanni Luca Gattobigio

Marcus Martinus Petrus Adrianus Vermeulen

Gheorghe Tanasa

Hans Butler

Harry Sewell

Hernes Jacobs

Arno Willem Frederik Volker

Leon Martin Levasier

Louis John Markoya

Ruud Antonius Catharina Maria Beerens

Dzmitry Labetski

Lucas Henricus Johannes Stevens

Noud Jan Gilissen

Olav Waldemar Vladimir Frijns

Hendrikus Gijsbertus Schimmel

Martijn Houkes

Jacobus Josephus Leijssen

Johannes Christiaan Leonardus Franken

Minne Cuperus

Bob Streefkerk

Pieter Willem Herman De Jager

Antonius Theodorus Anna Maria Derksen

Jan Bernard Plechelmus Van Schoot

Han-Kwang Nienhuys

Andrey Alexandrovich Nikipelov

Jozef Petrus Henricus Benschop

Willem Jurrianus Venema

Gosse Charles De Vries

Yang-Shan Huang

David Bessems

Sander Catharina Reinier Derks

Stig Bieling

Thomas Poiesz

Marcio Alexandre Cano Miranda

Yuri Johannes Gabriël Van De Vijver

Antonius Theodorus Wilhelmus Kempen

Dirk Willem Harberts

Takeshi Kaneko

Martinus Agnes Willem Cuijpers

Danny Maria Hubertus Philips

Gijs Kramer

Robert Gabriël Maria Lansbergen

A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.

Substrate support and substrate table

A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder

An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object are formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

Substrate holder and method of manufacturing a substrate holder

Substrate tables and methods of manufacturing substrate supports for substrate tables. In one arrangement, a plurality of holes are formed through a base member. A burl formation member is joined to the base member. A plurality of burl structures are formed in the burl formation member. Each burl structure includes a distal surface that contacts, in use, a substrate being supported. Each burl structure has an opening to at least one of the holes formed through the base member.

Method of manufacturing a substrate support for a lithographic apparatus, substrate table, lithographic apparatus, device manufacturing method, method of use

A method for preparing a substrate for an exposure process of a lithographic manufacturing method, the method including imposing different local temperatures across the substrate so as to induce different thermal expansion across the substrate before the exposure process. This method is for compensating for deformation of the substrate induced when the substrate is positioned on a substrate table of a lithographic apparatus. There is also provided a local temperature applicator to implement this technique and to a lithographic apparatus including such a local temperature applicator.

Method for preparing a substrate and lithographic apparatus

A substrate support configured to support a substrate. The substrate support has a plurality of burls protruding from a base surface of the substrate support. The burls have distal ends for supporting a lower surface of the substrate with a gap between the base surface of the substrate support and the lower surface of the substrate. The substrate support has a liquid supply channel configured to supply a conductive liquid to the gap so as to bridge the gap between the base surface of the substrate support and the lower surface of the substrate, to allow charge to pass between the substrate support and the substrate. The substrate support has a controlled electrical potential such that charge distribution at the lower surface of the substrate can be manipulated.

Substrate support, lithographic apparatus, method for manipulating charge distribution and method for preparing a substrate

A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

Lithographic apparatus and method

A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

Lithographic apparatus and a method of operating the apparatus

A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

A fluid handling system that includes a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also includes a mechanism configured to vibrate a vibration component in contact with the immersion liquid.

Fluid handling system, method and lithographic apparatus

A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.

Fluid handling structure for lithographic apparatus

Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.

Method and apparatus for forming a patterned layer of carbon, method of forming a patterned layer of material

A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body; a plurality of first burls provided on a first side of the main body and having end surfaces to support a substrate, wherein the first burls each include CrN; and a plurality of second burls provided on a second side of the main body.

A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, comprising at least one housing comprising at least one internal wall, at least one optical component arranged within at least one chamber defined at least in part by the at least one internal wall and configured to receive a radiation beam and a cooling apparatus arranged to cool at least a portion of the at least one internal wall to a temperature below that of the at least one optical component.

Lithographic apparatus and cooling method

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Almkerk, Netherlands

Nicolaas Ten Kate