The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2024
Filed:
Sep. 23, 2022
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Raymond Wilhelmus Louis LaFarre, Helmond, NL;
Nicolaas Ten Kate, Almkerk, NL;
Nina Vladimirovna Dziomkina, Eindhoven, NL;
Yogesh Pramod Karade, Eindhoven, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); C23C 16/44 (2006.01); G03F 7/00 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70716 (2013.01); C23C 16/44 (2013.01); G03F 7/70341 (2013.01); G03F 7/707 (2013.01); G03F 7/70975 (2013.01); H01L 21/6875 (2013.01); Y10T 29/49 (2015.01);
Abstract
A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.