The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2025
Filed:
Jan. 25, 2021
Asml Netherlands B.v., Veldhoven, NL;
Coen Hubertus Matheus Baltis, Eindhoven, NL;
Nicolaas Ten Kate, Almkerk, NL;
Marcus Martinus Petrus Adrianus Vermeulen, Leende, NL;
Siegfried Alexander Tromp, Knegsel, NL;
Frank Pieter Albert Van Den Berkmortel, Deurne, NL;
Niek Jacobus Johannes Roset, Eindhoven, NL;
Gijs Kramer, Nijmegen, NL;
Nicolaas Petrus Marcus Brantjes, Eindhoven, NL;
Michiel Theodorus Jacobus Fonteyn, Waalre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.