Company Filing History:
Years Active: 2025
Title: Michiel Theodorus Jacobus Fonteyn: Innovator in Lithographic Technology
Introduction
Michiel Theodorus Jacobus Fonteyn is a notable inventor based in Waalre, Netherlands. He has made significant contributions to the field of lithographic technology, particularly through his innovative patent. His work is essential in advancing the capabilities of lithographic apparatuses used in various industries.
Latest Patents
Fonteyn holds a patent for a "Substrate support and substrate table." This invention is designed to support a substrate in a lithographic apparatus. The substrate support includes a support body that is configured to hold the substrate securely. Additionally, it features a main body that is separate from the support body, which is designed to support the support body itself. This main body incorporates a thermal conditioner that can thermally condition the main body, support body, and/or substrate. Furthermore, an extractor body surrounds both the main and support bodies, equipped with an extraction channel that is intended to extract fluid from near the peripheral part of the substrate. Fonteyn has 1 patent to his name.
Career Highlights
Fonteyn is currently employed at ASML Netherlands B.V., a leading company in the development of lithography systems for the semiconductor industry. His role at ASML allows him to work on cutting-edge technology that is crucial for the production of integrated circuits.
Collaborations
Throughout his career, Fonteyn has collaborated with talented individuals such as Coen Hubertus Matheus Baltis and Nicolaas Ten Kate. These collaborations have likely contributed to the innovative advancements in the projects they have worked on together.
Conclusion
Michiel Theodorus Jacobus Fonteyn is a distinguished inventor whose work in lithographic technology has made a significant impact. His patent for a substrate support demonstrates his commitment to innovation in the field. As he continues to work at ASML Netherlands B.V., his contributions will undoubtedly shape the future of lithographic apparatuses.