The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2009

Filed:

Oct. 02, 2003
Applicants:

Joseph Consolini, Costa Mesa, CA (US);

Keith Best, Prunedale, CA (US);

Cheng Gui, Best, NL;

Alexander Friz, San Jose, CA (US);

Inventors:

Joseph Consolini, Costa Mesa, CA (US);

Keith Best, Prunedale, CA (US);

Cheng Gui, Best, NL;

Alexander Friz, San Jose, CA (US);

Assignee:

ASML Holdings N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method is disclosed for one embodiment. An amount of photoresist is deposited upon a substrate, the amount of photoresist more than necessary to coat the substrate. The substrate is spun within a bowl such that an excess amount of photoresist is propelled off of the substrate to an interior surface of the bowl. A portion of the excess amount of photoresist is recovered and treated such that the recovered portion of the excess amount of photoresist is rendered usable.


Find Patent Forward Citations

Loading…