Asml Netherlands B.v.

Asml Holding N.v.

Other

Carl Zeiss Smt Gmbh

Asml Holdings N.v.

Asme Netherlands B.v.

Stichting Nationaal Lucht&#x2014;en Ruimtevaartlaboratorium

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Bob Streefkerk

Jeroen Johannes Sophia Maria Mertens

Johannes Catharinus Hubertus Mulkens

Hans Jansen

Erik Roelof Loopstra

Johannes Jacobus Matheus Baselmans

Nicolaas Ten Kate

Martinus Hendrikus Antonius Leenders

Joeri Lof

Alexander Straaijer

Roelof Frederik De Graaf

Nicolaas Rudolf Kemper

Timotheus Franciscus Sengers

Helmar Van Santen

Jan-Gerard Cornelis Van Der Toorn

Aleksey Yurievich Kolesnychenko

Klaus Simon

Michel Riepen

Franciscus Johannes Herman Maria Teunissen

Joannes Theodoor De Smit

Martinus Cornelis Maria Verhagen

Henrikus Herman Marie Cox

Roelof Aeilko Siebrand Ritsema

Frits Van Der Meulen

Hendricus Johannes Maria Meijer

Hans Butler

Antonius Theodorus Anna Maria Derksen

Frank Van Schaik

Joost Jeroen Ottens

Johannes Henricus Wilhelmus Jacobs

Sergei Shulepov

Raymond Wilhelmus Louis Lafarre

Erik Theodorus Maria Bijlaart

Marcel Mathijs Theodore Marie Dierichs

Jacobus Johannus Leonardus Hendricus Verspay

Nina Vladimirovna Dziomkina

Herman Vogel

Yogesh Pramod Karade

Johannes Petrus Maria Smeulers

Elisabeth Corinne Rodenburg

Patricius Aloysius Jacobus Tinnemans

Marco Koert Stavenga

Marcel Beckers

Herman Boom

Felix Godfried Peter Peeters

Arie Jeffrey Den Boef

Marcus Adrianus Van De Kerkhof

Mark Kroon

Ferdy Migchelbrink

Bernardus Antonius Slaghekke

Arjen Boogaard

Richard Joseph Bruls

Adrianus Hendrik Koevoets

Antonius Johannus Van Der Net

Franciscus Johannes Joseph Janssen

Theodorus Petrus Maria Cadee

Paulus Martinus Maria Liebregts

Harry Sewell

Hernes Jacobs

Martijn Houben

Louis John Markoya

Jim Vincent Overkamp

Johannes Petrus Martinus Bernardus Vermeulen

Theodorus Marinus Modderman

Matthew Lipson

Antonius Franciscus Johannes De Groot

Jan Steven Christiaan Westerlaken

Ruud Antonius Catharina Maria Beerens

Marcus Martinus Petrus Adrianus Vermeulen

Vadim Yevgenyevich Banine

Johannes Hubertus Josephina Moors

Engelbertus Antonius Fransiscus Van Der Pasch

Simon Gijsbert Josephus Mathijssen

Siegfried Alexander Tromp

Sander Bas Roobol

Olav Waldemar Vladimir Frijns

Sander Catharina Reinier Derks

Marcel Koenraad Marie Baggen

Levinus Pieter Bakker

Koen Jacobus Johannes Maria Zaal

Jan Bernard Plechelmus Van Schoot

Thibault Simon Mathieu Laurent

Christian Wagner

Ronald Van Der Ham

Johan Gertrudis Cornelis Kunnen

Andrey Alexandrovich Nikipelov

Frank Johannes Jacobus Van Boxtel

Han-Kwang Nienhuys

Rogier Hendrikus Magdalena Cortie

Leon Martin Levasier

Edwin Johan Buis

Gosse Charles De Vries

Lucas Henricus Johannes Stevens

Bastiaan Lambertus Wilhelmus Marinus Van De Ven

Noud Jan Gilissen

Stig Bieling

Maxim Aleksandrovich Nasalevich

Michael Jozef Mathijs Renkens

Apparatus and method for measuring one or more parameters of a substrate using source radiation emitted from a radiation source and directed onto the substrate. The apparatus comprises at least one reflecting element and at least one detector. The at least one reflecting element is configured to receive a reflected radiation resulting from reflection of the source radiation from the substrate and further reflect the reflected radiation into a further reflected radiation. The at least one detector is configured for measurement of the further reflected radiation for determination of at least an alignment of the source radiation and/or the substrate.

Measuring method and measuring apparatus

A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder

An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object are formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

Substrate holder and method of manufacturing a substrate holder

A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.

Stage system, lithographic apparatus, method for positioning and device manufacturing method

Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

Lithographic apparatus and device manufacturing method

A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.

A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body; a plurality of first burls provided on a first side of the main body and having end surfaces to support a substrate, wherein the first burls each include CrN; and a plurality of second burls provided on a second side of the main body.

An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.

Cooling apparatus and plasma-cleaning station for cooling apparatus

A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

Fluid handling structure, lithographic apparatus and device manufacturing method

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's-Hertogenbosch, Netherlands

Sjoerd Nicolaas Lambertus Donders