The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2025

Filed:

Dec. 28, 2023
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Stef Marten Johan Janssens, Eindhoven, NL;

Bert Dirk Scholten, Best, NL;

Sjoerd Nicolaas Lambertus Donders, Vught, NL;

Teunis Van Dam, Eindhoven, NL;

Peter Mark Overschie, Eindhoven, NL;

Theresa Mary Spaan-Burke, Eindhoven, NL;

Siegfried Alexander Tromp, Knegsel, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2005.12); H01L 21/683 (2005.12); H01L 21/67 (2005.12);
U.S. Cl.
CPC ...
G03F 7/70725 (2012.12); G03F 7/707 (2012.12); G03F 7/70783 (2012.12); G03F 7/70816 (2012.12); H01L 21/6838 (2012.12); H01L 21/67288 (2012.12);
Abstract

A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.


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