The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2024
Filed:
Apr. 12, 2019
Asml Netherlands B.v., Veldhoven, NL;
Dennis De Graaf, Waalre, NL;
Richard Beaudry, Shefford, CA;
Maxime Biron, Bromont, CA;
Paul Janssen, Eindhoven, NL;
Thijs Kater, Eindhoven, NL;
Kevin Kornelsen, Bromont, CA;
Michael Alfred Josephus Kuijken, Son en Breugel, NL;
Jan Hendrik Willem Kuntzel, Eindhoven, NL;
Stephane Martel, Bromont, CA;
Maxim Aleksandrovich Nasalevich, Eindhoven, NL;
Guido Salmaso, Eindhoven, NL;
Pieter-Jan Van Zwol, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.