The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Aug. 20, 2020
Asml Netherlands B.v., Veldhoven, NL;
Andrey Nikipelov, Eindhoven, NL;
Sander Baltussen, Castenray, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Alexandr Dolgov, Waalre, NL;
Inci Donmez Noyan, Eindhoven, NL;
Zomer Silvester Houweling, Utrecht, NL;
Arnoud Willem Notenboom, Rosmalen, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Ties Wouter Van Der Woord, Helmond, NL;
Paul Alexander Vermeulen, Eindhoven, NL;
David Ferdinand Vles, Eindhoven, NL;
Victoria Voronina, Veldhoven, NL;
Halil Gökay Yegen, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.