Veldhoven, Netherlands

Victoria Voronina

This inventor holds 1 USPTO granted patent and 4 published patent applications, plus 1 CIPO patent. Top assignee: Asml Netherlands B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Victoria Voronina. Retrieved from https://idiyas.com/inventor/victoria-voronina

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0


Average Co-Inventor Count = 13.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Victoria Voronina: Innovator in Lithographic Technology

Introduction

Victoria Voronina is a prominent inventor based in Veldhoven, Netherlands. She has made significant contributions to the field of lithographic technology, particularly through her innovative patent related to pellicle membranes.

Latest Patents

Victoria Voronina holds a patent for a pellicle membrane designed for a lithographic apparatus. This membrane incorporates uncapped carbon nanotubes, enhancing its functionality. The patent also details a method for regenerating the pellicle membrane by decomposing a precursor compound and depositing the products onto the membrane. Additionally, it includes a method for reducing the etch rate of the pellicle membrane by providing an electric field to redirect ions or using heating elements to desorb radicals. This innovative approach positions her work at the forefront of lithographic technology.

Career Highlights

Victoria is currently employed at ASML Netherlands B.V., a leading company in the development of advanced lithography systems. Her work at ASML has allowed her to contribute to cutting-edge technologies that are essential for semiconductor manufacturing.

Collaborations

Victoria collaborates with Sander Baltussen, a fellow innovator in her field. Their partnership exemplifies the collaborative spirit that drives innovation in technology.

Conclusion

Victoria Voronina's contributions to lithographic technology through her innovative patent and her role at ASML Netherlands B.V. highlight her as a key figure in the advancement of this critical field. Her work continues to influence the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…