This inventor holds 1 USPTO granted patent and 3 published patent applications, plus 1 CIPO patent. Top assignee: Asml Netherlands B.v.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Alexandr Dolgov: Innovator in Lithographic Technology
Introduction
Alexandr Dolgov is a notable inventor based in Waalre, Netherlands. He has made significant contributions to the field of lithographic technology, particularly through his innovative patent related to pellicle membranes.
Latest Patents
Dolgov holds a patent for a pellicle membrane designed for a lithographic apparatus. This membrane incorporates uncapped carbon nanotubes, enhancing its functionality. The patent also details a method for regenerating the pellicle membrane by decomposing a precursor compound and depositing the decomposition products onto the membrane. Additionally, it describes a method for reducing the etch rate of the pellicle membrane by providing an electric field to redirect ions or using heating elements to desorb radicals. This innovative approach positions Dolgov as a key player in advancing lithographic technology.
Career Highlights
Dolgov is currently employed at ASML Netherlands B.V., a leading company in the development of lithographic systems for the semiconductor industry. His work at ASML has allowed him to contribute to cutting-edge technologies that are essential for modern electronics manufacturing.
Collaborations
Dolgov collaborates with Sander Baltussen, a fellow innovator in the field. Their partnership exemplifies the collaborative spirit that drives innovation in technology.
Conclusion
Alexandr Dolgov's contributions to lithographic technology through his innovative patent and work at ASML highlight his role as a significant inventor in the industry. His advancements in pellicle membranes are paving the way for future developments in semiconductor manufacturing.