The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2020
Filed:
Sep. 24, 2014
Asml Netherlands B.v., Veldhoven, NL;
Vadim Yevgenyevich Banine, Veldhoven, NL;
Petrus Rutgerus Bartraij, Veldhoven, NL;
Ramon Pascal Van Gorkom, Veldhoven, NL;
Lucas Johannes Peter Ament, Veldhoven, NL;
Pieter Willem Herman De Jager, Veldhoven, NL;
Gosse Charles De Vries, Veldhoven, NL;
Rilpho Ludovicus Donker, Veldhoven, NL;
Wouter Joep Engelen, Veldhoven, NL;
Olav Waldemar Vladimir Frijns, Veldhoven, NL;
Leonardus Adrianus Gerardus Grimminck, Veldhoven, NL;
Andelko Katalenic, Veldhoven, NL;
Erik Roelof Loopstra, Veldhoven, NL;
Han-Kwang Nienhuys, Veldhoven, NL;
Andrey Alexandrovich Nikipelov, Veldhoven, NL;
Michael Jozef Mathijs Renkens, Veldhoven, NL;
Franciscus Johannes Joseph Janssen, Veldhoven, NL;
Borgert Kruizinga, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.