The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2020
Filed:
Feb. 17, 2016
Asml Netherlands B.v., Veldhoven, NL;
Yvonne Wendela Kruijt-Stegeman, Eindhoven, NL;
Andre Bernardus Jeunink, Bergeijk, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Michael Jozef Mathijs Renkens, Sittard, NL;
Gerard Van Schothorst, Waardenburg, NL;
Johan Frederik Dijksman, Weert, NL;
Carolus Johannes Catharina Schoormans, Hooge Mierde, NL;
Adrianus Hendrik Koevoets, Mierlo, NL;
Catharinus De Schiffart, Nijmegen, NL;
Sander Frederik Wuister, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.