The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2026
Filed:
Nov. 23, 2021
Asml Netherlands B.v., Veldhoven, NL;
Petrus Wilhelmus Smorenburg, Veldhoven, NL;
Otger Jan Luiten, Eindhoven, NL;
Brian Herman Schaap, Eindhoven, NL;
Jim Gerardus Hubertus Franssen, Grathem, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method for controlling a density distribution of electrons provided by an electron source for use in hard X-ray, soft X-ray and/or extreme ultraviolet generation, the method comprising generating a plurality of electrons from a pattern of ultracold excited atoms using an ionization laser inside a cavity, wherein the electrons have a density distribution determined by at least one of the patterns of excited atoms and the ionization laser, and accelerating the electrons out of the cavity using a non-static acceleration profile, wherein the acceleration profile controls the density distribution of the electrons as they exit the cavity.