The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
Dec. 19, 2019
Asml Netherlands B.v., Veldhoven, NL;
Ying Luo, San Jose, CA (US);
Zhonghua Dong, Sunnyvale, CA (US);
Xuehui Yin, Union City, CA (US);
Long Di, San Jose, CA (US);
Nianpei Deng, Fremont, CA (US);
Wei Fang, Milpitas, CA (US);
Lingling Pu, San Jose, CA (US);
Ruochong Fei, San Jose, CA (US);
Bohang Zhu, San Jose, CA (US);
Yu Liu, San Jose, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively.