San Jose, CA, United States of America

Lingling Pu

USPTO Granted Patents = 12 

Average Co-Inventor Count = 3.6

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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12 patents (USPTO):Explore Patents

Title: Lingling Pu - Innovating the Future of Semiconductor Manufacturing

Introduction:

Lingling Pu, based in San Jose, CA, is a prolific inventor with a remarkable portfolio of 9 patents in the field of semiconductor manufacturing. His groundbreaking work at ASML Netherlands B.V. has revolutionized the industry's approach to in-die metrology and adaptive alignment techniques.

Latest Patents:

Among Lingling Pu's latest patents is the "In-die metrology methods and systems for process control," which introduces cutting-edge systems and methods for precise process control in semiconductor manufacturing. By utilizing target design patterns and advanced inspection techniques, this patent enhances the quality and efficiency of integrated circuit design processes. Similarly, his patent on "Method and apparatus for adaptive alignment" showcases his innovative approach to aligning wafer images with unparalleled accuracy, ensuring optimal performance in semiconductor fabrication.

Career Highlights:

Lingling Pu's career highlights underscore his invaluable contributions to semiconductor technology. His expertise in developing in-die metrology solutions and adaptive alignment methods has positioned him as a trailblazer in the field of semiconductor manufacturing. Through his patents, he continues to drive innovation and set new standards for process control and quality assurance in the industry.

Collaborations:

At ASML Netherlands B.V., Lingling Pu collaborates with esteemed coworkers such as Wei Fang and Wentian Zhou. Together, they form a dynamic team dedicated to pushing the boundaries of semiconductor innovation. Their combined efforts and expertise have led to groundbreaking advancements in wafer inspection, alignment technologies, and process optimization.

Conclusion:

In conclusion, Lingling Pu's pioneering work in in-die metrology and adaptive alignment has significantly impacted the semiconductor industry, setting a new benchmark for precision and efficiency in manufacturing processes. His patents reflect a dedication to excellence and a relentless pursuit of innovation, making him a key figure in shaping the future of semiconductor technology.

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