The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2025
Filed:
Mar. 05, 2020
Asml Netherlands B.v., Veldhoven, NL;
Ziyang Ma, Mountain View, CA (US);
Jin Cheng, Santa Clara, CA (US);
Ya Luo, Saratoga, CA (US);
Leiwu Zheng, San Jose, CA (US);
Xin Guo, Sunnyvale, CA (US);
Jen-Shiang Wang, Sunnyvale, CA (US);
Yongfa Fan, Sunnyvale, CA (US);
Feng Chen, San Jose, CA (US);
Yi-Yin Chen, Santa Clara, CA (US);
Chenji Zhang, San Jose, CA (US);
Yen-Wen Lu, Saratoga, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method for training a patterning process model, the patterning process model configured to predict a pattern that will be formed by a patterning process. The method involves obtaining an image data associated with a desired pattern, a measured pattern of the substrate, a first model including a first set of parameters, and a machine learning model including a second set of parameters; and iteratively determining values of the first set of parameters and the second set of parameters to train the patterning process model. An iteration involves executing, using the image data, the first model and the machine learning model to cooperatively predict a printed pattern of the substrate; and modifying the values of the first set of parameters and the second set of parameters such that a difference between the measured pattern and the predicted pattern is reduced.