Leiwu Zheng

Title: Innovation Spotlight: Leiwu Zheng - Pioneering Patents in San Jose, CA

Introduction:

Leiwu Zheng, a prolific inventor based in San Jose, CA, is revolutionizing the field of technology with his groundbreaking patents. With a keen eye for detail and a passion for innovation, Zheng has made significant contributions to the industry.

Latest Patents:

1. Etch Bias Characterization and Method of Using the Same: Zheng's latest patent involves a method for determining an etch bias for a pattern during the etching process. By utilizing an innovative etch bias model with a mathematical formula, Zheng's method allows for precise adjustments to the patterning process, resulting in enhanced efficiency and accuracy.

2. Methods of Tuning Process Models: Zheng's second patent focuses on constructing process models for simulating product characteristics in lithography. By comparing variations between simulated and measured characteristics, Zheng's methods enable the adjustment of process model parameters to optimize product outcomes.

Career Highlights:

Leiwu Zheng currently works at ASML Netherlands B.V., a leading technology company at the forefront of semiconductor manufacturing equipment. His expertise and innovative mindset have propelled him to success in developing cutting-edge solutions for the industry.

Collaborations:

In his professional journey, Zheng has collaborated closely with esteemed coworkers such as Mu Feng and Jen-Shiang Wang. Together, they have fostered a culture of innovation and collaboration, driving forward the boundaries of technological advancement.

Conclusion:

Leiwu Zheng's inventive spirit and dedication to advancement are evident in his remarkable patent portfolio. With a focus on precision and excellence, Zheng continues to shape the future of technology and inspire innovators worldwide.